JPH0441505B2 - - Google Patents

Info

Publication number
JPH0441505B2
JPH0441505B2 JP59015801A JP1580184A JPH0441505B2 JP H0441505 B2 JPH0441505 B2 JP H0441505B2 JP 59015801 A JP59015801 A JP 59015801A JP 1580184 A JP1580184 A JP 1580184A JP H0441505 B2 JPH0441505 B2 JP H0441505B2
Authority
JP
Japan
Prior art keywords
mos transistor
conductivity type
semiconductor
drain
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59015801A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60160651A (ja
Inventor
Nobuaki Myagawa
Yoshiaki Yazawa
Shoichi Oozeki
Takahide Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Minebea Power Semiconductor Device Inc
Original Assignee
Hitachi Ltd
Hitachi Haramachi Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Haramachi Electronics Ltd filed Critical Hitachi Ltd
Priority to JP59015801A priority Critical patent/JPS60160651A/ja
Publication of JPS60160651A publication Critical patent/JPS60160651A/ja
Publication of JPH0441505B2 publication Critical patent/JPH0441505B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85—Complementary IGFETs, e.g. CMOS
    • H10D84/859—Complementary IGFETs, e.g. CMOS comprising both N-type and P-type wells, e.g. twin-tub

Landscapes

  • Logic Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP59015801A 1984-01-31 1984-01-31 半導体装置 Granted JPS60160651A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59015801A JPS60160651A (ja) 1984-01-31 1984-01-31 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59015801A JPS60160651A (ja) 1984-01-31 1984-01-31 半導体装置

Publications (2)

Publication Number Publication Date
JPS60160651A JPS60160651A (ja) 1985-08-22
JPH0441505B2 true JPH0441505B2 (en]) 1992-07-08

Family

ID=11898938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59015801A Granted JPS60160651A (ja) 1984-01-31 1984-01-31 半導体装置

Country Status (1)

Country Link
JP (1) JPS60160651A (en])

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6424626A (en) * 1987-07-21 1989-01-26 Nippon Telegraph & Telephone Digital control type variable capacitor device
US5181094A (en) * 1988-09-29 1993-01-19 Mitsubishi Denki Kabushiki Kaisha Complementary semiconductor device having improved device isolating region
JPH02168666A (ja) * 1988-09-29 1990-06-28 Mitsubishi Electric Corp 相補型半導体装置とその製造方法
US5021858A (en) * 1990-05-25 1991-06-04 Hall John H Compound modulated integrated transistor structure
JPH0492913U (en]) * 1990-12-27 1992-08-12
JP3808116B2 (ja) * 1995-04-12 2006-08-09 富士電機デバイステクノロジー株式会社 高耐圧ｉｃ
EP2325889B1 (en) 1995-04-12 2015-06-10 Fuji Electric Co., Ltd. High voltage integrated circuit, high voltage junction terminating structure, and high voltage MIS transistor

Also Published As

Publication number Publication date
JPS60160651A (ja) 1985-08-22

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